PerkinElmer NexION 300S ICP-MS

Engineered to deliver a level of stability, flexibility and performance never before seen in an ICP-MS instrument, the award-winning NexION 300 represents the first truly significant and revolutionary industry advancement in recent memory. For the first time ever, a single ICP-MS instrument offers both the simplicity and convenience of a collision cell and the exceptional detection limits of a true reaction cell. With this patented Universal Cell Technology (UCT), analysts can now choose the most appropriate technique for a specific sample or application. No restrictions on which gases you can use. No limits on your mass range. No compromises on how you choose to work. And no hassles switching from one mode to another. Just the promise of superior accuracy and detection limits, faster analysis times, and an easier, more customizable operator experience than with any other instrument on the market. Signal responses are kept stable hour after hour by a unique Triple Cone Interface and Quadrupole Ion Deflector. Designed to remove an unprecedented level of un-ionized material (and preventing it from entering the Universal Cell), this innovative ion path keeps the instrument clean, minimizing drift and completely eliminating the need for cell cleanings.

The NexION 300S is a Dual-channel Universal Cell that has been optimized for sensitivity. Designed specifically for the semiconductor industry.

The system uses pure reactive gases to remove any and all interferences with little or no loss of analyte sensitivity. The NexION 300S configuration was designed specifically for the semiconductor industry.

Features of the NexION 300S:

•   Simultaneous dual mode (analog/digital detector)

•   Large, accessible sample introduction system

•   Low liquid uptake nebulizer

•   Free-running RF plasma generator

•   Automated X, Y, Z torch positioning

•   Patented PlasmaLok® technology

•   Fastest scanning quadrupole in the industry

•   Universal Cell Technology™

•   Quadrupole Ion Deflector

•   Triple Cone Interface

•   Plasma View window

•   Four-stage vacuum system

•   Benchtop design